Thermal Chemical Vapor Deposition System

Located in the Nanocarbon and Sensor Laboratory, Chemical Vapor Deposition (CVD) is a chemical process, typically used for the deposition of various thin films and nanostructured materials.  Conventionally, in the CVD process, the substrate is heated to a desired temperature in the reaction chamber and then slowly exposed to one or more chemical precursors, which eventually react and/or decompose on the substrate surface to produce films.  The film growth rate is determined by three key several parameters; i) the temperature of the substrate, ii) the operating pressure of the reactor, iii) the composition and chemistry of the precursor gas-phase. Our current system works up to temperature 1200oC. Various metal oxide and carbon based nanomaterials can be produced on substrates, which can sustain high temperature. The system can also be used for thermal annealing purpose.