Pulsed Electron/Laser deposition

Located in the Functional Oxide Materials Laboratory, the high vacuum deposition system (Make: Neosera, USA) can produce layer by layer growth of thin complex oxide thin films with the help of either 20 kev pulsed electron (max frequency 5 Hz) under various ambient gases and temperature ranging from room temperature to 800 C.  The pressure during deposition can be varied from ultra-high vacuum to 700 mTorr.